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Semiconductor Ultra-pure Water System

Ultra-pure water system for electronics and semiconductor industries consists of four core steps: pretreatment, reverse osmosis, ultra-purification and post-treatment. QILEE customizes ultra-pure water system of various flow rates and outlet water quality as per client requirements.

• ≥18 mω resistivity

• <5 ppb toc

• <0.1 ppb silica

Advantages of Our Semiconductor Ultra-pure Water System

The system adopts modular design with advanced water treatment technology of double-stage RO + EDI + mixed bed. It is designed in strict accordance with the latest technical standards to guarantee stable water quality and long-term reliable operation.
Process Flow
1. Traditional water treatment method using ion exchange resin to produce ultra-pure water for the electronics industry.


Its basic process flow:
● Raw Water → Multi-media Filter → Activated Carbon Filter → Cartridge Filter → Intermediate Water Tank → Cation Bed → Anion Bed → Mixed Bed (Dual Bed) → Ultra-pure Water Tank → UPW Pump → Post Security Filter → Point of Use
2. Combined method of reverse osmosis water treatment equipment and ion exchange equipment for ultra-pure water production for electronics industry.

Its basic process flow:
● Raw Water → Multi-media Filter → Activated Carbon Filter → Cartridge Filter → Intermediate Water Tank → Reverse Osmosis System → Mixed Bed (Dual Bed) → Ultra-pure Water Tank → UPW Pump → Post Security Filter → Point of Use
3. Ultra-pure water production by combining reverse osmosis system with Electrodeionization (EDI). This is an eco-friendly, cost-effective UPW production process with great development potential.

Its basic process flow:
● Raw Water → Multi-media Filter → Activated Carbon Filter → Cartridge Filter → Intermediate Water Tank → Reverse Osmosis System → Electrodeionization (EDI) → Ultra-pure Water Tank → UPW Pump → Post Security Filter → Point of Use
Sound experience
Real Systems, Real Performance
Factory photos of QILEE EDI systems built and tested at our Shanghai facility before shipment.
DI 2-Module System
SS316L skid • Dual EDI modules • Integrated control panel • Resistivity monitoring
EDI 4-Module Large-Scale System
4 × EDI modules • Power distribution cabinet • Multi-channel resistivity display • Auto alarm
Application Fields
 Ultra Low Energy Consumption
Water for cleaning electronic and semiconductor materials, components, aluminum foils and workpieces in electrolytic capacitor manufacturing;
Process water for picture tube and fluorescent screen production, including glass bulb cleaning, precipitation, wetting, film washing and tube diameter cleaning;
Solution preparation water for cleaning during liquid crystal display manufacturing;
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In electronic chip production, mainly used for silicon wafer cleaning, with a small portion for chemical solution preparation and slicing;
High-purity water for silicon wafer cleaning in IC manufacturing, as well as water for high-quality picture tube and phosphor production;
Process water for LCD, LED and PDP plasma display panels;
icon7 (3)
Water for photovoltaic wafer slicing and optoelectronic product manufacturing;
Production water for storage batteries, lithium batteries and solar cells;
Surface treatment water for electroplating, coating, automotive, metal and other high-end precision machinery & micro-precision products;
Laboratory water for research institutes in metal, chemical, biological and other fields;
Production & processing water for military enterprises and research institutions in aerospace, astronomy, nuclear power sectors.
Core Industry Specifications
Semiconductor IC / DRAM / NAND
Compliant with SEMI F63, 18 MΩ·cm, for wafer cleaning
Display Panels LCD / OLED
Glass substrate cleaning, low silica requirement
Solar PV TOPCon / HJT
Silicon wafer texturing & coating; affects minority carrier lifetime
Pharmaceutical & Biotechnology
USP purified water, endotoxin <0.001 EU/mL
Conductivity <0.1 μS/cm, mixed bed replacement, 50% OPEX reduction
HPLC / ICP-MS / cell culture, ISO 3696 Grade 1
Resistivity >10 MΩ·cm, copper plating cleaning
Conductivity <1 μS/cm, MEA protection

QILEE EDI vs. Conventional Alternatives

CriteriaQILEE RO + EDIMixed-Bed IEXConventional RO Only
Product resistivity✅ ≥18 MΩ·cm guaranteed⚠️ 10–18 MΩ·cm (degrades)❌ ~0.05–1 MΩ·cm
Chemical regeneration✅ None — DC current only❌ Acid + caustic, every 2–3 weeks✅ None
Operational continuity✅ 24/7 uninterrupted❌ 4–8 hr downtime per cycle✅ Continuous
OPEX (chemicals)✅ Near zero❌ USD 20,000–80,000/yr✅ Low (antiscalant only)
TOC removal✅ <5 ppb (UV + EDI)⚠️ Partial (depends on resin)❌ Limited
SEMI F63 compliance✅ Full compliance⚠️ Only when freshly regenerated❌ Not applicable
Hazardous waste✅ None❌ Acid + caustic effluent⚠️ Concentrate only
Footprint✅ Compact skid / 40HQ⚠️ Large (vessel + chemical tanks)✅ Compact
Get your free technical proposal in 48 hours
Send us your feed water analysis and flow requirements. our engineers will design a system and send you a detailed technical proposal with sizing, p&id sketch, and budgetary price, at no cost, no obligation.
Tell Us More About Your Project !
If you have any questions about water treatment systems, please feel free to contact QILEE.
  Stable equipment
  Mature technology
  Automated operation
  Simple operation

Please leave us a message with any questions.

Contact Us

Tel: +86 13370035529

Business What's App: +86 13636655908

E-mail: qilee@qileegroup.com

Add: No. 351 Wenqu Road, Fengxian District, Shanghai

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